{"id":400165,"date":"2020-12-15T11:03:10","date_gmt":"2020-12-15T16:03:10","guid":{"rendered":"http:\/\/www.marketnewsdesk.com\/?p=400165"},"modified":"2020-12-15T11:03:10","modified_gmt":"2020-12-15T16:03:10","slug":"primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020","status":"publish","type":"post","link":"https:\/\/www.marketnewsdesk.com\/index.php\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\/","title":{"rendered":"Primarius Will Present an Invited Paper on Spec-Driven Extraction Flow and Exhibit at IEDM 2020"},"content":{"rendered":"<div class=\"mw_release\">\n<p>SAN JOSE, Calif., Dec.  15, 2020  (GLOBE NEWSWIRE) &#8212; This year, the\u00a0IEEE International Electron Devices Meeting (IEDM)\u00a0themed &#8220;Innovative Devices for a Better Future&#8221;, will be held virtually December 12~18. There will be rich technical programs with 41 sessions covering electronics technologies being used much more broadly than ever before to address the world\u2019s most pressing challenges.<\/p>\n<p align=\"justify\">Primarius will present \u2018Enabling Efficient Design-Technology Interaction by Spec-Driven Extraction Flow\u2019, an invited paper. In Dr. Huanlin Chang\u2019s presentation, he will discuss a new methodology Specification-Driven Extraction Flow (SDEF) to address the inefficiency of the current design technology co-optimization (DTCO) flow. Dr Chang will detail how designers can use SDEF to sign off the technology development without the reliance of foundry SPICE models for the first time. His presentation will take place at 11:40 a.m. Friday, December 18 during Session 41: Memory Technology DTCO of advanced logic and memory.<\/p>\n<p align=\"justify\">Primarius will also host a virtual booth in the online exhibition area. It will showcase the company\u2019s unique memory EDA flow and innovative EDA solutions from data acquisition to simulation. This comprehensive technology offering enables efficient Design Technology Co-Optimization (DTCO) that semiconductor engineers need during process technology development and chip design at advanced process nodes.<\/p>\n<p align=\"justify\">In addition to SDEP, Primarius will display its complete range of simulation, modeling, test, and service offerings. Its simulation tools on view will include NanoSpice Pro, NanoSpice, NanoSpice Giga, NanoYield, and Nanowave. Modeling tools showcased will be <a href=\"https:\/\/www.globenewswire.com\/Tracker?data=vv_x6D6-ba57rfGya5a-2uBMMcQcYWOurouwlkfbe-YpHf2le7urv653Kvpcj4LneQa9FC3fY0zKJZ5QEtEW83apUYzPPzRZg3Np92ej4uM=\" rel=\"nofollow noopener noreferrer\" target=\"_blank\">SDEP<\/a>, BSIMProPlus, MeQLab, ME-Pro, and PQLab. Test equipment featured will include FS-Pro, <a href=\"https:\/\/www.globenewswire.com\/Tracker?data=ETUYoI_W03lsvyQLn4p83DEs87_XEsvArZ5_dw5JQXFBTdjHKy-05DpkO9CfZpqTu9LRYODjjmkrN1WKbhAD0GOIlb6NUhVjK3nBa98M-5E=\" rel=\"nofollow noopener noreferrer\" target=\"_blank\">9812DX<\/a> and  FastLab. Finally, information on the company\u2019s Semiconductor Engineering Service will also be available.<\/p>\n<p align=\"justify\">\n        <strong>About IEDM<\/strong>\n      <\/p>\n<p align=\"justify\">The\u00a0IEEE International Electron Devices Meeting (IEDM)\u00a0is an annual micro- and nanoelectronics conference held each December that serves as the world\u2019s pre-eminent forum for reporting technological breakthroughs in the areas of\u00a0<a href=\"https:\/\/www.globenewswire.com\/Tracker?data=tgyvtGGnfg_e7Q8DVfErlgBCu8a55QXcv-d1fKGR2R8itIj64qHTq7tVvoVlgzpi1kMgHODgsGSTBTlzWi0cL1APSe-A03fHgtwd3Ld518M=\" rel=\"nofollow noopener noreferrer\" target=\"_blank\">semiconductor<\/a>\u00a0and electronic device technology, design, manufacturing, physics, and modeling.<\/p>\n<p align=\"justify\">IEDM is the recognized flagship conference for nanometer-scale CMOS transistor technology, advanced memory, displays, sensors, MEMS devices, novel quantum and nano-scale devices and phenomenology, optoelectronics, devices for power and energy harvesting, high-speed devices, as well as process technology and device modeling and simulation. IEDM has always been viewed as a leading technology indicator. With disclosing state-of-the-art results from semiconductor manufacturers &amp; research institutions around the world, IEDM 2020 will provide an excellent snapshot &amp; forecast of the semiconductor industry.<\/p>\n<p align=\"justify\">To register and find more information, please visit\u00a0<a href=\"https:\/\/www.globenewswire.com\/Tracker?data=iWtGuDXAsm1Q6wZdh0bZgoNsp6aWg2Ho-TXeNLZoH9vxii1dT50Gsh7qRh5FydUtL3GITdOOzUohaWqqjI291dFTgtapTLNOyXaERukjDvc=\" rel=\"nofollow noopener noreferrer\" target=\"_blank\">https:\/\/ieee-iedm.org\/<\/a>.<\/p>\n<p align=\"justify\">Jonah McLeod<br \/>510-449-8634<br \/><a href=\"https:\/\/www.globenewswire.com\/Tracker?data=NTIN8_TDSXedXEmO-Uk5_-FDE1JehHa7hKSgtM0zOZzyBPtt7XpYhKnZcWNtbOWNpb3ySuhhzaOZiKmNEYmBzxj20KA-MCnqtVgD-9fgzzs=\" rel=\"nofollow noopener noreferrer\" target=\"_blank\">jonahm@khai-long.com<\/a>\u00a0<\/p>\n<p>      <img loading=\"lazy\" decoding=\"async\" class=\"__GNW8366DE3E__IMG\" src=\"https:\/\/www.globenewswire.com\/newsroom\/ti?nf=ODExMjE4NSMzODgxNDUxIzIwOTQ0MTc=\" width=\"1\" height=\"1\" \/><br \/>\n      <br \/>\n      <img loading=\"lazy\" decoding=\"async\" class=\"__GNW8366DE3E__IMG\" src=\"https:\/\/ml.globenewswire.com\/release\/track\/e420b4f3-c889-4b9d-b329-441a9c3447c8\" width=\"1\" height=\"1\" \/>\n    <\/div>\n<div class=\"mw_contactinfo\"><\/div>\n","protected":false},"excerpt":{"rendered":"<p>SAN JOSE, Calif., Dec. 15, 2020 (GLOBE NEWSWIRE) &#8212; This year, the\u00a0IEEE International Electron Devices Meeting (IEDM)\u00a0themed &#8220;Innovative Devices for a Better Future&#8221;, will be held virtually December 12~18. There will be rich technical programs with 41 sessions covering electronics technologies being used much more broadly than ever before to address the world\u2019s most pressing challenges. Primarius will present \u2018Enabling Efficient Design-Technology Interaction by Spec-Driven Extraction Flow\u2019, an invited paper. In Dr. Huanlin Chang\u2019s presentation, he will discuss a new methodology Specification-Driven Extraction Flow (SDEF) to address the inefficiency of the current design technology co-optimization (DTCO) flow. Dr Chang will detail how designers can use SDEF to sign off the technology development without the reliance of foundry SPICE models for &hellip; <\/p>\n<p class=\"link-more\"><a href=\"https:\/\/www.marketnewsdesk.com\/index.php\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\/\" class=\"more-link\">Continue reading<span class=\"screen-reader-text\"> &#8220;Primarius Will Present an Invited Paper on Spec-Driven Extraction Flow and Exhibit at IEDM 2020&#8221;<\/span><\/a><\/p>\n","protected":false},"author":2,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[],"tags":[],"class_list":["post-400165","post","type-post","status-publish","format-standard","hentry"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.4 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Primarius Will Present an Invited Paper on Spec-Driven Extraction Flow and Exhibit at IEDM 2020 - Market Newsdesk<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.marketnewsdesk.com\/index.php\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Primarius Will Present an Invited Paper on Spec-Driven Extraction Flow and Exhibit at IEDM 2020 - Market Newsdesk\" \/>\n<meta property=\"og:description\" content=\"SAN JOSE, Calif., Dec. 15, 2020 (GLOBE NEWSWIRE) &#8212; This year, the\u00a0IEEE International Electron Devices Meeting (IEDM)\u00a0themed &#8220;Innovative Devices for a Better Future&#8221;, will be held virtually December 12~18. There will be rich technical programs with 41 sessions covering electronics technologies being used much more broadly than ever before to address the world\u2019s most pressing challenges. Primarius will present \u2018Enabling Efficient Design-Technology Interaction by Spec-Driven Extraction Flow\u2019, an invited paper. In Dr. Huanlin Chang\u2019s presentation, he will discuss a new methodology Specification-Driven Extraction Flow (SDEF) to address the inefficiency of the current design technology co-optimization (DTCO) flow. Dr Chang will detail how designers can use SDEF to sign off the technology development without the reliance of foundry SPICE models for &hellip; Continue reading &quot;Primarius Will Present an Invited Paper on Spec-Driven Extraction Flow and Exhibit at IEDM 2020&quot;\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.marketnewsdesk.com\/index.php\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\/\" \/>\n<meta property=\"og:site_name\" content=\"Market Newsdesk\" \/>\n<meta property=\"article:published_time\" content=\"2020-12-15T16:03:10+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.globenewswire.com\/newsroom\/ti?nf=ODExMjE4NSMzODgxNDUxIzIwOTQ0MTc=\" \/>\n<meta name=\"author\" content=\"Newsdesk\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Written by\" \/>\n\t<meta name=\"twitter:data1\" content=\"Newsdesk\" \/>\n\t<meta name=\"twitter:label2\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data2\" content=\"2 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\\\/\\\/www.marketnewsdesk.com\\\/index.php\\\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\\\/#article\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/www.marketnewsdesk.com\\\/index.php\\\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\\\/\"},\"author\":{\"name\":\"Newsdesk\",\"@id\":\"https:\\\/\\\/www.marketnewsdesk.com\\\/#\\\/schema\\\/person\\\/482f27a394d4fda80ecb5499e519d979\"},\"headline\":\"Primarius Will Present an Invited Paper on Spec-Driven Extraction Flow and Exhibit at IEDM 2020\",\"datePublished\":\"2020-12-15T16:03:10+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\\\/\\\/www.marketnewsdesk.com\\\/index.php\\\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\\\/\"},\"wordCount\":419,\"image\":{\"@id\":\"https:\\\/\\\/www.marketnewsdesk.com\\\/index.php\\\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\\\/#primaryimage\"},\"thumbnailUrl\":\"https:\\\/\\\/www.globenewswire.com\\\/newsroom\\\/ti?nf=ODExMjE4NSMzODgxNDUxIzIwOTQ0MTc=\",\"inLanguage\":\"en-US\"},{\"@type\":\"WebPage\",\"@id\":\"https:\\\/\\\/www.marketnewsdesk.com\\\/index.php\\\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\\\/\",\"url\":\"https:\\\/\\\/www.marketnewsdesk.com\\\/index.php\\\/primarius-will-present-an-invited-paper-on-spec-driven-extraction-flow-and-exhibit-at-iedm-2020\\\/\",\"name\":\"Primarius Will Present an Invited Paper on Spec-Driven Extraction Flow and Exhibit at IEDM 2020 - 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There will be rich technical programs with 41 sessions covering electronics technologies being used much more broadly than ever before to address the world\u2019s most pressing challenges. Primarius will present \u2018Enabling Efficient Design-Technology Interaction by Spec-Driven Extraction Flow\u2019, an invited paper. In Dr. Huanlin Chang\u2019s presentation, he will discuss a new methodology Specification-Driven Extraction Flow (SDEF) to address the inefficiency of the current design technology co-optimization (DTCO) flow. 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